Structural and morphological properties of CeO2 films deposited by radio frequency magnetron sputtering for back-end-of-line integration

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Ahsan Hayat , Markus Ratzke , Carlos Alvarado Chavarin , Marvin H. Zoellner , Agnieszka Anna Corley-Wiciak , Markus Andreas Schubert , Christian Wenger , Inga A. Fischer
{"title":"Structural and morphological properties of CeO2 films deposited by radio frequency magnetron sputtering for back-end-of-line integration","authors":"Ahsan Hayat ,&nbsp;Markus Ratzke ,&nbsp;Carlos Alvarado Chavarin ,&nbsp;Marvin H. Zoellner ,&nbsp;Agnieszka Anna Corley-Wiciak ,&nbsp;Markus Andreas Schubert ,&nbsp;Christian Wenger ,&nbsp;Inga A. Fischer","doi":"10.1016/j.tsf.2024.140547","DOIUrl":null,"url":null,"abstract":"<div><div>Cerium oxides have potential applications ranging from low-temperature gas sensing to photodetection. A back-end-of-line integration of the material into complementary metal-oxide-semiconductor device fabrication processes has many advantages but places limits on material deposition, most notably the thermal budget for deposition and annealing. Here, we investigate thin cerium oxide films deposited by radio frequency (RF) magnetron sputtering at substrate temperatures of 300 °C and RF magnetron powers between 30 W and 70 W without any post-deposition annealing steps. Our investigation of the structural and morphological properties reveals a columnar texture of the thin films, and we find that the material is composed predominantly of CeO<sub>2</sub> (111), with a large degree of crystallinity. We discuss implications for resistive gas sensing applications.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"807 ","pages":"Article 140547"},"PeriodicalIF":2.0000,"publicationDate":"2024-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609024003481","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0

Abstract

Cerium oxides have potential applications ranging from low-temperature gas sensing to photodetection. A back-end-of-line integration of the material into complementary metal-oxide-semiconductor device fabrication processes has many advantages but places limits on material deposition, most notably the thermal budget for deposition and annealing. Here, we investigate thin cerium oxide films deposited by radio frequency (RF) magnetron sputtering at substrate temperatures of 300 °C and RF magnetron powers between 30 W and 70 W without any post-deposition annealing steps. Our investigation of the structural and morphological properties reveals a columnar texture of the thin films, and we find that the material is composed predominantly of CeO2 (111), with a large degree of crystallinity. We discuss implications for resistive gas sensing applications.
用于后端集成的射频磁控溅射沉积 CeO2 薄膜的结构和形态特性
铈氧化物的潜在应用范围从低温气体传感到光电探测。将这种材料后端集成到互补金属氧化物半导体器件制造工艺中具有许多优势,但也对材料沉积造成了限制,其中最主要的是沉积和退火的热预算。在此,我们研究了通过射频(RF)磁控溅射沉积的氧化铈薄膜,该薄膜的基底温度为 300 °C,射频磁控功率为 30 W 至 70 W,无需任何沉积后退火步骤。我们对结构和形态特性的研究发现,薄膜具有柱状纹理,而且材料主要由 CeO2 (111) 组成,具有很高的结晶度。我们讨论了电阻式气体传感应用的意义。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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