High-Performance Carbon Nanotube Optoelectronic Transistor With Optimized Process for 3D Communication Circuit Applications

IF 4.6 Q2 MATERIALS SCIENCE, BIOMATERIALS
Shuang Liu;Heyi Huang;Yanqing Li;Yadong Zhang;Feixiong Wang;Zhaohao Zhang;Qingzhu Zhang;Jiali Huo;Jiaxin Yao;Jing Wen;Huaxiang Yin
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Abstract

One-dimensionalcarbon nanotube field-effect transistors (CNFETs) have offered a solution for obtaining high transistor performance in a compatible low-temperature BEOL process, enabling monolithic 3D integration benefits for more functional circuits. Currently, CNT transistors need to further improve their performance with a more stable process and explore the most suitable circuit application scene. In this study, we successfully enhanced the performance of CNFETs through special Y2O3 film passivation and vacuum annealing processes. The on-state current of the optimized device was improved by $36.6\times $ compared to the device without these processes. Besides, the subthreshold swing (SS) was notably reduced from 259 mV/dec to 215 mV/dec and the threshold voltage was decreased from 2.02 V to 1.79 V due to the reduction of the interface state. Meanwhile, the devices’ optoelectronic characteristics were significantly improved and exhibited a $72\times $ increase in $\Delta $ Ids under identical illumination. With an improved annealing process, the $\Delta $ Ids were further increased to $231\times $ compared to the original device because of the reduction of defects within the device. Finally, the tentative Morse code communication applications all by the optimized CNFETs were obtained. These technologies and functional implementations provided a promising approach for future 3D functional communication systems with CNT technology.
针对 3D 通信电路应用优化工艺的高性能碳纳米管光电晶体管
一维碳纳米管场效应晶体管(CNFET)为在兼容的低温 BEOL 工艺中获得高晶体管性能提供了一种解决方案,可实现单片三维集成,从而实现更多功能电路。目前,碳纳米管晶体管需要通过更稳定的工艺进一步提高性能,并探索最适合的电路应用场景。在本研究中,我们通过特殊的 Y2O3 薄膜钝化和真空退火工艺,成功提高了 CNFET 的性能。与未采用这些工艺的器件相比,优化器件的导通电流提高了 36.6 倍。此外,由于界面状态的降低,阈下摆幅(SS)从 259 mV/dec 显著降低到 215 mV/dec,阈值电压从 2.02 V 降低到 1.79 V。同时,器件的光电特性也得到了显著改善,在相同的光照条件下,器件的Ids增加了72倍。通过改进退火工艺,由于器件内部缺陷的减少,与原始器件相比,$\Delta $ Ids 进一步增加到 $231\times$。最后,经过优化的 CNFET 获得了初步的莫尔斯电码通信应用。这些技术和功能实现为未来采用 CNT 技术的三维功能通信系统提供了一种前景广阔的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS Applied Bio Materials
ACS Applied Bio Materials Chemistry-Chemistry (all)
CiteScore
9.40
自引率
2.10%
发文量
464
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