Luyuan Feng , Zefeng Sun , Yifei Chen , Hongtong Li , Yifan Chen , Haoran Liu , Renhe Liu , Zongyang Zhao , Jian Liang , Zhen Zhang , Jiehu Kang , Bin Wu
{"title":"Rapid in-situ accuracy evaluation and exposure optimization method for fringe projection profilometry","authors":"Luyuan Feng , Zefeng Sun , Yifei Chen , Hongtong Li , Yifan Chen , Haoran Liu , Renhe Liu , Zongyang Zhao , Jian Liang , Zhen Zhang , Jiehu Kang , Bin Wu","doi":"10.1016/j.optlastec.2024.111844","DOIUrl":null,"url":null,"abstract":"<div><div>Fringe projection profilometry (FPP) has become one of the most powerful techniques for three-dimensional (3D) non-contact measurement. However, in practical scenarios, the various reflectivity of the unknown measured objects often greatly makes the system unable to achieve the theoretical precision under the same system parameter settings. Therefore, the adaptively system parameter setting is essential to be developed. In this paper, we propose a novel metric model, i.e. the accuracy quality function, for initial accuracy evaluation using in-situ acquired images under the current parameter settings. The causes that potentially affects the ultimate accuracy are analyzed via theoretical derivation and further adopted within the evaluation model. In addition, an optimal exposure selection method based just two images is carried out to fast adjusting. Experimental results demonstrated that the proposed accuracy quality model aligns well with the actual condition. Under optimal exposure, it achieved a significant reduction in phase error by 36.15% and by 21.39% in low- and high- exposure, highlighting its strong performance and potential for high-accuracy and in-situ 3D shape measurement applications.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"181 ","pages":"Article 111844"},"PeriodicalIF":4.6000,"publicationDate":"2024-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0030399224013021","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
Fringe projection profilometry (FPP) has become one of the most powerful techniques for three-dimensional (3D) non-contact measurement. However, in practical scenarios, the various reflectivity of the unknown measured objects often greatly makes the system unable to achieve the theoretical precision under the same system parameter settings. Therefore, the adaptively system parameter setting is essential to be developed. In this paper, we propose a novel metric model, i.e. the accuracy quality function, for initial accuracy evaluation using in-situ acquired images under the current parameter settings. The causes that potentially affects the ultimate accuracy are analyzed via theoretical derivation and further adopted within the evaluation model. In addition, an optimal exposure selection method based just two images is carried out to fast adjusting. Experimental results demonstrated that the proposed accuracy quality model aligns well with the actual condition. Under optimal exposure, it achieved a significant reduction in phase error by 36.15% and by 21.39% in low- and high- exposure, highlighting its strong performance and potential for high-accuracy and in-situ 3D shape measurement applications.
期刊介绍:
Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication.
The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas:
•development in all types of lasers
•developments in optoelectronic devices and photonics
•developments in new photonics and optical concepts
•developments in conventional optics, optical instruments and components
•techniques of optical metrology, including interferometry and optical fibre sensors
•LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow
•applications of lasers to materials processing, optical NDT display (including holography) and optical communication
•research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume)
•developments in optical computing and optical information processing
•developments in new optical materials
•developments in new optical characterization methods and techniques
•developments in quantum optics
•developments in light assisted micro and nanofabrication methods and techniques
•developments in nanophotonics and biophotonics
•developments in imaging processing and systems