{"title":"Influence of post-annealing treatment on the performance of perovskite solar cells with different hole transport layers","authors":"Fei Tang , Nanxi Ma , Feiping Lu","doi":"10.1016/j.mssp.2024.108941","DOIUrl":null,"url":null,"abstract":"<div><div>The performance of perovskite solar cells (PSCs) is one of the key factors influencing their industrialization and market competitiveness. In this paper, post-annealing treatment, which is an effective and simple method, was used to enhance the performance of PSCs. PSCs with different hole transport layer (HTL) were prepared, and the effect of post-annealing treatment on the performance of PSCs was investigated. The results showed that post-annealing treatment could enhance the carrier extraction ability of HTL, reduce the defects in the perovskite layer, decrease non-radiative recombination, and effectively improve the device performance when PTAA was included in the HTL. After annealing treatment, it was found that the PCSs with NiO<sub>x</sub>/PTAA as the transport layer, the champion device of PSCs can achieve a PCE of 21.21 %. Compared to devices using only NiO<sub>x</sub> and PPAA as hole transport layers, the PCE increased by 36.9 % and 3 %, respectively. Meanwhile, when using NiO<sub>x</sub>/PTAA as the transport layer, compared to devices without annealing treatment, the PCE increased from 17.95 % to 21.21 %, resulting in an 18.2 % enhancement. The obtained results in this work can provide an important theoretical basis for researchers to understand the physical mechanism of post-annealing treatment on device performance and fabricate perovskite solar cells with high-performance.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":null,"pages":null},"PeriodicalIF":4.2000,"publicationDate":"2024-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800124008370","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The performance of perovskite solar cells (PSCs) is one of the key factors influencing their industrialization and market competitiveness. In this paper, post-annealing treatment, which is an effective and simple method, was used to enhance the performance of PSCs. PSCs with different hole transport layer (HTL) were prepared, and the effect of post-annealing treatment on the performance of PSCs was investigated. The results showed that post-annealing treatment could enhance the carrier extraction ability of HTL, reduce the defects in the perovskite layer, decrease non-radiative recombination, and effectively improve the device performance when PTAA was included in the HTL. After annealing treatment, it was found that the PCSs with NiOx/PTAA as the transport layer, the champion device of PSCs can achieve a PCE of 21.21 %. Compared to devices using only NiOx and PPAA as hole transport layers, the PCE increased by 36.9 % and 3 %, respectively. Meanwhile, when using NiOx/PTAA as the transport layer, compared to devices without annealing treatment, the PCE increased from 17.95 % to 21.21 %, resulting in an 18.2 % enhancement. The obtained results in this work can provide an important theoretical basis for researchers to understand the physical mechanism of post-annealing treatment on device performance and fabricate perovskite solar cells with high-performance.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.