{"title":"Exploration of a High-Efficiency G -Band Klystron Combined With Multigap Cavity and Kladistron Principles","authors":"Zhenting Zheng;Zhigang Lu;Peng Gao;Jingrui Duan;Xiaofan Gui;Zheng Chang;Zhanliang Wang;Yuan Zheng;Huarong Gong;Shaomeng Wang;Yubin Gong","doi":"10.1109/TPS.2024.3453969","DOIUrl":null,"url":null,"abstract":"In this article, a new bunching method, which was inspired by the kladistron technology, is proposed to enable high-efficiency operation of klystrons in high-frequency bands. This new bunching method combines the kladistron principle and the extended interaction klystron (EIK), and a G-band klystron based on it is designed to verify the new bunching method. Based on the same unit cell, an EIK and a klystron based on kladistron principle are designed for comparison. With a beam current of 0.6 A and a voltage of 18.8 kV, the 3-D particle-in-cell (PIC) results show a maximum output power of 644.41 W and an electron efficiency of 5.71%, which is higher than the EIK (533.66 W and 4.73%) and the klystron based on kladistron principle (554.45 W and 4.92%). The output cavity was optimized by adjusting the positions of the coupling holes and velocity tapering, resulting in a saturated output power of 712.15 W and an electron efficiency of 6.31%.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"3021-3028"},"PeriodicalIF":1.3000,"publicationDate":"2024-09-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10682507/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
In this article, a new bunching method, which was inspired by the kladistron technology, is proposed to enable high-efficiency operation of klystrons in high-frequency bands. This new bunching method combines the kladistron principle and the extended interaction klystron (EIK), and a G-band klystron based on it is designed to verify the new bunching method. Based on the same unit cell, an EIK and a klystron based on kladistron principle are designed for comparison. With a beam current of 0.6 A and a voltage of 18.8 kV, the 3-D particle-in-cell (PIC) results show a maximum output power of 644.41 W and an electron efficiency of 5.71%, which is higher than the EIK (533.66 W and 4.73%) and the klystron based on kladistron principle (554.45 W and 4.92%). The output cavity was optimized by adjusting the positions of the coupling holes and velocity tapering, resulting in a saturated output power of 712.15 W and an electron efficiency of 6.31%.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.