Design of a novel CMOS instrumentation amplifier using 90 nm technology

Divya Sharma, Vijay Nath
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Abstract

In this article, a novel Complementary Metal Oxide Semiconductor (CMOS) instrumentation amplifier is designed using UMC 90 nm technology with an operating power supply of ± 0.9 V. A differential and operational amplifier with improved gain and low power dissipation were also designed. Because of the ease with which gain may be varied, instrumentation amplifiers have traditionally been preferred. Instead of passive-resistive loads, NMOS is used as active loads (in linear region behaves like a resistor), reducing the die area and lowering power consumption. As a result, active loads produce greater resistance values than passive loads, leading to higher power gains. Previous studies of two-stage Op-Amps have shown that the overall gain is lowered when there is a resistive load at the output. Another issue with a two-stage Op-Amps is the trade-off between speed and gain. An instrumentation amplifier with 97.69 dB differential gain and 135.72 dB common mode rejection ratio (CMRR) has been attained utilising Cadence virtuoso environment UMC 90 nm CMOS process, and the layout area of proposed design with padding is 79.005 μm × 85.17 μm.

Abstract Image

利用 90 纳米技术设计新型 CMOS 仪表放大器
本文采用 UMC 90 纳米技术设计了一种新型互补金属氧化物半导体(CMOS)仪表放大器,其工作电源电压为 ± 0.9 V。由于增益易于改变,仪表放大器历来是首选。NMOS 取代了无源电阻负载,被用作有源负载(在线性区域表现类似于电阻),从而减少了芯片面积并降低了功耗。因此,有源负载比无源负载产生更大的电阻值,从而带来更高的功率增益。以往对两级运算放大器的研究表明,当输出端存在电阻负载时,整体增益会降低。两级运算放大器的另一个问题是速度与增益之间的权衡。利用 Cadence virtuoso 环境下的 UMC 90 纳米 CMOS 工艺,实现了 97.69 dB 差分增益和 135.72 dB 共模抑制比 (CMRR) 的仪表放大器,带填充的拟议设计布局面积为 79.005 μm × 85.17 μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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