{"title":"Vulnerability of L-Band LNA to the Out-of-Band HPM","authors":"Mingwen Zhang;Chunguang Ma;Ruilong Song;Yong Luo","doi":"10.1109/TPS.2024.3439130","DOIUrl":null,"url":null,"abstract":"In this article, the radio frequency (RF) performance degradation induced by out-of-band high-power microwave (HPM) is studied by simulation and experiment. The latent threat of the X-band HPM to the L-band low-noise amplifier (LNA) is verified by experiments. Due to the nonlinearity of active devices, the gain decreases under HPM inference, the nonlinear response of the LNA is investigated from the physical model, and the injection experiment shows that both the duty ratio and peak power of the HPM significantly influence the LNA gain.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 6","pages":"2050-2058"},"PeriodicalIF":1.3000,"publicationDate":"2024-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10635002/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
In this article, the radio frequency (RF) performance degradation induced by out-of-band high-power microwave (HPM) is studied by simulation and experiment. The latent threat of the X-band HPM to the L-band low-noise amplifier (LNA) is verified by experiments. Due to the nonlinearity of active devices, the gain decreases under HPM inference, the nonlinear response of the LNA is investigated from the physical model, and the injection experiment shows that both the duty ratio and peak power of the HPM significantly influence the LNA gain.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.