Effect of Low-Pressure Glow Discharge Cold Plasma on the Quality Characteristics of Button Mushroom (Agaricus bisporus)

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
M. M. Pragalyaashree;V. Arun Joshy;R. Freeda Blessie;D. Tiroutchelvame;Shanmuga Velayutham
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Abstract

The present study was carried out to examine the efficacy of low-pressure glow discharge cold plasma on the quality characteristics of button mushrooms (Agaricus bisporus). Low-pressure (0.6 mbar) glow discharge was obtained to generate a cold plasma at 200 V with an electrode gap of 11 cm in the plasma chamber. Mushroom samples were exposed to cold plasma for different durations of time (5–15 min). The physical, chemical, and microbial qualities of the treated and untreated mushroom samples were compared. The plasma treatment on mushroom did not adversely affect the critical quality parameters, i.e., phenolic content, total antioxidant activity, elemental composition, surface morphology, color, texture, pH, and weight loss. The result of insignificance was observed with pH, texture, and weight loss for the treated and untreated samples. It was inferred from the results that there was a slight loss in nutritional properties as the treatment time increased but a greater reduction in microbial population. The shorter the duration of exposure, the greater the quality retention. The mushrooms treated with cold plasma for a period of 15 min showed higher elimination of microorganism. The scanning electron microscope (SEM) results revealed that the topology and the roughness of the original smooth surfaces of the virgin substrate were dramatically changed after plasma treatment.
低压辉光放电冷等离子体对双孢蘑菇品质特征的影响
本研究旨在探讨低压辉光放电冷等离子体对金针菇(Agaricus bisporus)品质特征的影响。通过低压(0.6 毫巴)辉光放电产生 200 伏的冷等离子体,等离子体室的电极间隙为 11 厘米。蘑菇样品暴露在冷等离子体中的时间长短不一(5-15 分钟)。比较了处理过和未处理过的蘑菇样品的物理、化学和微生物质量。对蘑菇进行等离子处理不会对关键质量参数(即酚含量、总抗氧化活性、元素组成、表面形态、颜色、质地、pH 值和重量损失)产生不利影响。经处理和未经处理的样品在 pH 值、质地和失重方面的结果均不明显。从结果中可以推断出,随着处理时间的延长,营养特性略有下降,但微生物数量减少较多。暴露时间越短,质量保持率越高。用冷等离子体处理 15 分钟的蘑菇显示出较高的微生物消除率。扫描电子显微镜(SEM)结果显示,经过等离子处理后,原生基质原有光滑表面的拓扑结构和粗糙度发生了显著变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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