Method of Measuring Field Emission Current Under High-Voltage Pulse

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2024-09-04 DOI:10.1109/TPS.2024.3450729

Yue Wu;Jian-cang Su;Hao-Ran Zhang;Xu-Dong Qiu;Bin-Xiong Yu;Liang Zhao;Shuai Shao;Ming-Zhu Gao;Jia-Ru Shi

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引用次数: 0

Abstract

A method of measuring field emission current under high-voltage (HV) pulse is proposed. The method makes it more convenient to study electron emission under HV pulse. Based on the Kirchhoff law, this method can fundamentally solve the problem, which the emission current is usually covered up by the displacement current. In addition, the method can ensure the safety of oscilloscope and the accuracy of the measurement when the gap gets breakdown. The resolution analysis of this method is carried out. The resolution is positively correlated with the output resistance and negatively correlated with the summation of output capacitance and electrodes capacitance. The resolution, under microsecond and millisecond HV pulse, can achieve

$\mu $

A to A class. The measurement platform based on this method contains an energy-storage capacitor, a load resistor, an HV pulse power supply, an electrode cavity, and three resistor-capacitor (R–C) voltage dividers.

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高电压脉冲下的场发射电流测量方法

提出了一种在高压脉冲下测量场发射电流的方法。该方法为研究高压脉冲下的电子发射提供了更多便利。基于基尔霍夫定律，该方法从根本上解决了发射电流通常被位移电流掩盖的问题。此外，该方法还能确保示波器的安全性和间隙击穿时的测量精度。对该方法进行了分辨率分析。分辨率与输出电阻呈正相关，与输出电容和电极电容之和呈负相关。在微秒级和毫秒级高压脉冲下，分辨率可达到 $\mu $ A 至 A 级。基于该方法的测量平台包含一个储能电容器、一个负载电阻、一个高压脉冲电源、一个电极腔和三个电阻电容（R-C）分压器。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.