Advances in optical coating uniformity of interference filters

IF 3.1 3区 物理与天体物理 Q2 Engineering
Optik Pub Date : 2024-07-30 DOI:10.1016/j.ijleo.2024.171980
V.I. Skomorovsky, V.A. Proshin, G.I. Kushtal, L.S. Tokareva, S.V. Firstov
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引用次数: 0

Abstract

We propose a method to obtain uniform multilayer coatings using vacuum assemblies with a linear ion source to manufacture narrow-band interference filters essential in astrophysical research for space object imaging in important spectral lines, and to provide multi-channel fiber-optic transmission of information. Interference filters and other optical systems, for example, high-reflective mirrors, steep-front beam splitters contain up to hundreds of film layers deposited onto a substrate. During the coating deposition, film thickness on the substrate must be strictly withstood and be uniform throughout the entire surface. This can be achieved by placing the linear source and target on the same platform and by conducting a test target sputtering on a fixed substrate. There is an inflection line on the coating thickness distribution on the substrate. By moving the platform, the inflection line midpoint is aligned with the center of the rotating working substrate, and in this position, the substrate is coated to a specified thickness, which is monitored during the deposition process.

干涉滤波器光学镀膜均匀性的进步
我们提出了一种利用线性离子源真空装配获得均匀多层镀膜的方法,用于制造天体物理学研究中必不可少的窄带干涉滤光片,以便在重要光谱线上对空间物体进行成像,并提供多通道光纤信息传输。干涉滤光片和其他光学系统,如高反射镜、陡前分光镜等,包含多达数百个沉积在基底上的薄膜层。在涂层沉积过程中,基片上的薄膜厚度必须严格控制,并在整个表面保持一致。将线性源和靶放在同一平台上,并在固定基底上进行测试靶溅射,就能实现这一目标。基底上的涂层厚度分布有一条拐点线。通过移动平台,拐点线的中点就会与旋转工作基片的中心对齐,在这个位置上,基片就会镀上指定的厚度,并在沉积过程中对其进行监测。
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来源期刊
Optik
Optik 物理-光学
CiteScore
6.90
自引率
12.90%
发文量
1471
审稿时长
46 days
期刊介绍: Optik publishes articles on all subjects related to light and electron optics and offers a survey on the state of research and technical development within the following fields: Optics: -Optics design, geometrical and beam optics, wave optics- Optical and micro-optical components, diffractive optics, devices and systems- Photoelectric and optoelectronic devices- Optical properties of materials, nonlinear optics, wave propagation and transmission in homogeneous and inhomogeneous materials- Information optics, image formation and processing, holographic techniques, microscopes and spectrometer techniques, and image analysis- Optical testing and measuring techniques- Optical communication and computing- Physiological optics- As well as other related topics.
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