Sputter deposited silver niobate thin films: Pathway towards phase purity

Abstract

The quest for environmentally sustainable alternatives to lead-based dielectric materials in dielectric capacitors has led research to the exploration of options such as silver niobate (AgNbO₃), which has been found to display excellent energy storage properties. Homogeneity and phase-purity of the used thin films are vital for optimal performance of these devices. In this study, a systematic variation of oxygen partial pressure and bias voltage during reactive d.c. magnetron co-sputtering from metallic targets is employed to synthesise AgNbO₃ thin films. Structural and chemical composition of the films are investigated using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, elastic recoil detection analysis, and Rutherford backscattering spectrometry. The findings emphasise the necessity of precise parameter control during deposition to avoid the presence of undesirable secondary phases like Ag and Ag₂Nb₄O₁₁ and to ensure the formation of homogeneous and phase-pure AgNbO₃ thin films. The gained insights demonstrate the potential of reactive d.c. magnetron sputtering for the deposition of lead-free AgNbO₃ thin films, offering pathways for enhanced environmental compatibility of future dielectric capacitors.