Langmuir Probe Diagnosis of a Cold Atmospheric Plasma Jet

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
S. James Raja;S. Akhildas;M. R. Nirmal;Lintu Rajan;Venu Anand
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Abstract

Langmuir probe characterization of cold atmospheric plasma (CAP) jet requires placing the probe directly in the downstream region, which generates additional filament discharges and alters the plasma characteristics. Also, the large sheath thickness compared to the low mean free path at atmospheric pressure and large plasma flow velocity forbids the use of conventional collisionless stationary plasma theory for probe analysis. In this work, a system has been envisaged to sample the CAP jet into a low-pressure chamber using an orifice for Langmuir probe-based plasma diagnostics. Simulations were performed to ascertain the possibility of generating and maintaining a low pressure inside such an open chamber, while the increase in gas velocity can be kept at a minimum value. Based on the simulation results, a chamber was fabricated and the results were verified experimentally. A Langmuir probe based on a double probe configuration was developed to acquire the I–V curve from the sampled plasma. The effects of sheath collisions, fluid velocity, and pressure differential were accommodated in the probe analysis to calculate the electron temperature and ion number density.
冷大气等离子体射流的朗缪尔探针诊断
对冷大气等离子体(CAP)射流进行朗缪尔探针表征需要将探针直接置于下游区域,这会产生额外的丝状放电并改变等离子体特性。此外,与常压下较低的平均自由路径相比,较大的鞘厚度和较大的等离子体流动速度使得探针分析无法使用传统的无碰撞静止等离子体理论。在这项工作中,设想了一种系统,利用一个孔口将 CAP 射流采样到一个低压室,用于基于朗缪尔探针的等离子体诊断。我们进行了模拟,以确定在这种开放式腔体内产生和保持低压的可能性,同时将气体速度的增加保持在最小值。根据模拟结果制作了一个腔室,并通过实验验证了结果。开发了一种基于双探针配置的朗缪尔探针,用于获取取样等离子体的 I-V 曲线。在探针分析中考虑了鞘碰撞、流体速度和压差的影响,从而计算出电子温度和离子数密度。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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