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Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank

Journal of micro/nanopatterning, materials, and metrology Pub Date : 2024-07-12 DOI:10.1117/1.jmm.23.4.041402
Tao Shen, I. Mochi, Dongmin Jeong, Elisabeth Mueller, Paolo Ansuinelli, Jinho Ahn, Yasin Ekinci
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极紫外衰减移相掩膜坯的光谱反射仪特性分析
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Journal of micro/nanopatterning, materials, and metrology
Journal of micro/nanopatterning, materials, and metrology
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