Degradation analysis of GaN-based high–electron-mobility transistors under different stresses in semi-on state conditions

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Qian Wen , Chunsheng Guo , Meng Zhang , Xiang Zheng , Shiwei Feng , Yamin Zhang
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Abstract

The large numbers of high-energy carriers that occur in semiconductor devices under semi-on state conditions can cause significant device degradation. The effects of different stresses on the electrical and trapping characteristics of GaN-based high-electron-mobility transistors (HEMTs) are investigated. Test results for GaN HEMTs under semi-on state conditions show that the electrical characteristics of these devices degrade to a certain extent after they are subjected to electrical pulse stress cycles with different drain voltage, frequencies, and duty cycles; a degree of degradation also occurs in the electrical characteristics of the devices when they are subjected to direct current electrical stresses. After electrical stress is applied, the absolute amplitude of the traps in the device increases, thus indicating an increase in the trap density. The results show that voltage is the main driver for device damage, with the current playing an accelerating role through its effects on device temperature or by supplying hot electrons; therefore, the drain voltage has the most significant effect on device degradation, which is mainly due to channel high-energy hot electron injection.

半导通状态下不同应力作用下氮化镓基高电子迁移率晶体管的降解分析
在半导态条件下,半导体器件中出现的大量高能载流子会导致器件严重退化。本文研究了不同应力对氮化镓基高电子迁移率晶体管(HEMT)的电气和捕获特性的影响。半导态条件下 GaN HEMT 的测试结果表明,在承受不同漏极电压、频率和占空比的电脉冲应力循环后,这些器件的电气特性会出现一定程度的退化;在承受直流电应力时,器件的电气特性也会出现一定程度的退化。施加电应力后,器件中陷阱的绝对振幅增大,从而表明陷阱密度增加。结果表明,电压是器件损坏的主要驱动因素,而电流则通过影响器件温度或提供热电子起到加速作用;因此,漏极电压对器件劣化的影响最为显著,而器件劣化主要是由于沟道高能热电子注入造成的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
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