Influence of the Bulb Geometry and Electrical Supply Parameters on the UV Emission of DBD Excimer Lamps

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2024-06-28 DOI:10.1007/s11090-024-10480-w

Arnold Wiesner, Rafael Diez, Hubert Piquet

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Abstract

The aim of this article is to improve the performance of DBD excimer lamps systems for UV production. Within this framework, our approach considers two distinct directions: the geometric dimensions of the double-barrier lamp bulb and the characteristics of the power supply. To explore these directions, a sampling of 19 bulbs of different geometries is considered, and a specially designed power supply is used, capable of controlling the shape (duration and magnitude) and frequency of current pulses injected into the plasma. A dedicated test bench, including a supervisory program that drives the power supply and collects system performance data, is used to perform parametric sweeps and guarantee measurement repeatability: the set of electrical parameters is fully explored for each lamp, and each experiment is characterized by UV emission performance and electrical generator operating conditions. Multiquadric response surfaces, used to format the results of this multi-variable exploration, reveal the most efficient directions for system optimization: increasing gas volume and, at a given operating frequency, providing the shortest possible current pulses with high amplitude can increase both UV emission and conversion efficiency.

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灯泡几何形状和电源参数对 DBD 准分子灯紫外线发射的影响

本文旨在提高用于紫外线生产的 DBD 准分子灯系统的性能。在此框架内，我们的方法考虑了两个不同的方向：双阻隔灯泡的几何尺寸和电源的特性。为了探索这些方向，我们对 19 个不同几何尺寸的灯泡进行了取样，并使用了专门设计的电源，该电源能够控制注入等离子体的电流脉冲的形状（持续时间和幅度）和频率。专用的测试台（包括驱动电源和收集系统性能数据的监控程序）用于执行参数扫描和保证测量的可重复性：对每盏灯的电气参数集进行了充分的探索，每次实验都以紫外线发射性能和电气发生器的工作条件为特征。多方位响应曲面用于格式化这种多变量探索的结果，揭示了最有效的系统优化方向：增加气体体积，以及在给定的工作频率下，提供尽可能短的高振幅电流脉冲，可以提高紫外线发射和转换效率。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

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