Particle Condensation in Two-Temperature (2T) Arc Plasmas of Various SF6 Replacements

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Linlin Zhong, Bayitake Baheti, Qi Wu
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Abstract

Fluorinated gases, e.g., CF3I, C3F8, C4F8, C4F7N, and C5F10O, show potential to replace SF6 in power industry due to their high dielectric strength and low global warming potential . However, particle condensation from arc plasmas of these compounds may reduce dielectric performance. We perform a systematic investigation of particle condensation in two-temperature (2T) arc plasmas of various SF6 replacements mixed with CO2, N2, and O2, by the Gibbs free energy minimization and entropy maximization methods. The influences of buffer gases, non-equilibrium degree, and gas pressure on particle condensation are discussed in various cases. The results indicate that O2 is necessary to prevent graphite formation in carbon–fluorine gaseous arcs, and specific mixing ratios of CO2 and N2 are required to avoid graphite and iodine crystals in CF3I arc plasmas. The relationship between condensation temperature and non-equilibrium degree is complex, with peaks and valleys observed for graphite and iodine crystal condensation temperatures. Moreover, different calculation methods (Gibbs free energy minimization versus entropy maximization) show varying sensitivity of condensation temperatures to pressure changes. All the above findings highlight the importance of considering non-equilibrium effects and multiple condensed species in evaluating arc plasma compositions of SF6 replacements.

Abstract Image

各种 SF6 替代品的双温 (2T) 电弧等离子体中的粒子凝结
氟化气体(如 CF3I、C3F8、C4F8、C4F7N 和 C5F10O)具有介电强度高、全球变暖潜能值低的特点,因此有望在电力工业中取代 SF6。然而,这些化合物的电弧等离子体产生的粒子凝结可能会降低介电性能。我们采用吉布斯自由能最小化和熵最大化方法,对各种 SF6 替代品与 CO2、N2 和 O2 混合的双温(2T)电弧等离子体中的粒子凝结进行了系统研究。讨论了各种情况下缓冲气体、非平衡度和气体压力对粒子凝聚的影响。结果表明,在碳氟化合物气态电弧中,O2 是防止石墨形成的必要条件;在 CF3I 电弧等离子体中,CO2 和 N2 的特定混合比是避免石墨和碘结晶的必要条件。凝结温度与非平衡度之间的关系很复杂,石墨和碘晶体的凝结温度会出现峰值和谷值。此外,不同的计算方法(吉布斯自由能最小化与熵最大化)显示了凝结温度对压力变化的不同敏感性。所有上述发现都突出表明,在评估 SF6 替代品的电弧等离子体成分时,考虑非平衡效应和多种冷凝物种非常重要。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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