{"title":"Program Start Bias Grouping to Compensate for the Geometric Property of a String in 3-D NAND Flash Memory","authors":"Sungju Kim;Sangmin Ahn;Sechun Park;Jongwoo Kim;Hyungcheol Shin","doi":"10.1109/JEDS.2024.3372971","DOIUrl":null,"url":null,"abstract":"The string (STR) with various geometrical profiles in 3-D NAND flash cause the degradation of program efficiency. This is because the program speed differences among WL layers within the STR are caused by the geometrical properties observed through measurement results. In this work, we propose the method to reduce the program speed differences based on a word-line (WL) grouping in terms of threshold voltage (Vth) distribution to compensate for the program start voltage (Vstart). To address various geometrical profiles, we consider a flexible compensation method through \n<inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>\nPeak_Vth, i.e., the net amount of movement from the erase to the program state. \n<inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>\nPeak_Vth according to WL layers clearly distinguished the geometrical properties among WL layers, and through this, the linearity of \n<inline-formula> <tex-math>$\\Delta $ </tex-math></inline-formula>\nPeak_Vth is frequently observed for specific WL layer intervals with taper profile. Utilizing this linearity, we conducted the WL grouping and successfully demonstrated \n<inline-formula> <tex-math>$\\text{V}_{\\mathrm{ start}}$ </tex-math></inline-formula>\n compensation by applying the proposed method to each WL group through the measurement of a commercial 3-D NAND package. Moreover, the reduced WL grouping method is also contrived to relax circuit design complications and evaluated the usefulness of the proposed method.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":null,"pages":null},"PeriodicalIF":2.0000,"publicationDate":"2024-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10459337","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10459337/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The string (STR) with various geometrical profiles in 3-D NAND flash cause the degradation of program efficiency. This is because the program speed differences among WL layers within the STR are caused by the geometrical properties observed through measurement results. In this work, we propose the method to reduce the program speed differences based on a word-line (WL) grouping in terms of threshold voltage (Vth) distribution to compensate for the program start voltage (Vstart). To address various geometrical profiles, we consider a flexible compensation method through
$\Delta $
Peak_Vth, i.e., the net amount of movement from the erase to the program state.
$\Delta $
Peak_Vth according to WL layers clearly distinguished the geometrical properties among WL layers, and through this, the linearity of
$\Delta $
Peak_Vth is frequently observed for specific WL layer intervals with taper profile. Utilizing this linearity, we conducted the WL grouping and successfully demonstrated
$\text{V}_{\mathrm{ start}}$
compensation by applying the proposed method to each WL group through the measurement of a commercial 3-D NAND package. Moreover, the reduced WL grouping method is also contrived to relax circuit design complications and evaluated the usefulness of the proposed method.
期刊介绍:
The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.