Research on a Compensation Correction Algorithm for the Removal Function of Atmospheric-Pressure Plasma Processing

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Jun Chen, Lunzhe Wu, Lin Wang, Chen Hu, Chaoyang Wei, Jianda Shao
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Abstract

Atmospheric-pressure plasma processing (APPP) is an important method for the fabrication of high-precision optics because it involves highly efficient and nondamaging material removal based on its pure chemical etching mechanism. However, owing to the heat accumulation phenomenon caused by the jet heat flux, the nonlinearity of the material removal rate in APPP is inevitable, making it difficult to achieve deterministic optical surfacing. To bridge this gap, this study focused on analyzing the nonlinear relationship between the material removal rate and heat accumulation. The simulation results indicated that when the sliding distance increased from 10 to 50 mm, the surface temperature of the workpiece increased from 387.3 to 419.5 K, an increase of more than 8%. When the dwell time increased from 0.33 to 2 s, the surface temperature of the workpiece increased from 348.1 to 419.5 K (including the effect of sliding distance), an increase of more than 21%. A novel algorithm that simultaneously considers dwell time and sliding distance was proposed based on the results. A threshold parameter tq was introduced to determine whether to correct the deviation caused by the sliding distance. With the proposed algorithm, the matching residual surface root-mean-square (RMS) error decreased from 97.5 to 39.6 nm. The RMS deviation error of the matching residual surface error converged from 11.6 to 4.7% after surface-figuring experiments. The proposed algorithm is expected to provide a promising solution for future deterministic optical surfacing.

Abstract Image

Abstract Image

大气压等离子体加工去除功能的补偿校正算法研究
常压等离子体加工(APPP)是制造高精度光学器件的重要方法,因为它基于纯化学蚀刻机制,涉及高效、无损伤的材料去除。然而,由于喷射热流造成的热累积现象,APPP 的材料去除率不可避免地存在非线性,因此很难实现确定性的光学表面处理。为了弥补这一缺陷,本研究重点分析了材料去除率与热累积之间的非线性关系。模拟结果表明,当滑动距离从 10 mm 增加到 50 mm 时,工件表面温度从 387.3 K 增加到 419.5 K,增幅超过 8%。当停留时间从 0.33 秒增加到 2 秒时,工件表面温度从 348.1 K 上升到 419.5 K(包括滑动距离的影响),增幅超过 21%。根据研究结果,提出了一种同时考虑停留时间和滑动距离的新算法。引入了一个阈值参数 tq 来决定是否修正滑动距离造成的偏差。采用该算法后,匹配残余表面均方根误差从 97.5 nm 降至 39.6 nm。经过表面配置实验,匹配残余表面误差的均方根偏差从 11.6% 收敛到 4.7%。所提出的算法有望为未来的确定性光学表面处理提供一种有前途的解决方案。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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