First-Principles Calculations to Investigate the Ground State, Mechanical Stability, Electronic Structure, and Optical Properties of Tl2SnX3 (X = S, Se, Te)

IF 1.5 4区 材料科学 Q3 Chemistry
Hanen Alhussain, Hela Ferjani, Youssef Ben Smida
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Abstract

In this work, the Density Functional Theory (DFT) analysis of the Tl2SnX3 series (X = S, Se, Te) is performed, and the ground states are confirmed by the calculation of the elastic constant Cij. Based on the DFT calculation, the Tl2SnX3 structures are direct-gap semiconductors with bandgaps of 1.434, 1.181, and 0.907 eV, respectively. Chalcogen substitution significantly impacts their electronic structures, notably increasing the Density of States (DOS) width in the valence band from sulfur to tellurium, and shifting the dielectric function's real part, ε1(ω), toward lower energies. This change means that the optical activity and response to electric fields are better, with Tl2SnTe3 showing the best polarization response and light-matter interaction abilities. Optical tests show that Tl2SnTe3 has very high optical absorption, peaking at ≈17 × 104 cm−1 along [010], and reflectivity levels above 90%, marking its suitability for high-reflectivity applications. Moreover, loss energy function analysis also shows that Tl2SnTe3 has a strong electron loss resonance at lower energies, which means it has strong interactions with electrons.

Abstract Image

通过第一性原理计算研究 Tl2SnX3(X = S、Se、Te)的基态、机械稳定性、电子结构和光学特性
本文对 Tl2SnX3 系列(X = S、Se、Te)进行了密度泛函理论(DFT)分析,并通过计算弹性常数 Cij 确认了基态。根据 DFT 计算,Tl2SnX3 结构是直接隙半导体,带隙分别为 1.434、1.181 和 0.907 eV。卤代烃的取代对它们的电子结构产生了重大影响,特别是增加了价带中从硫到碲的状态密度(DOS)宽度,并使介电常数的实部ε1(ω)向低能移动。这种变化意味着光学活性和对电场的响应更好,Tl2SnTe3 显示出最佳的偏振响应和光物质相互作用能力。光学测试表明,Tl2SnTe3 具有非常高的光吸收,沿[010]方向的峰值为 ≈17 × 104 cm-1,反射率水平超过 90%,这标志着它适用于高反射率应用。此外,损耗能函数分析还表明,Tl2SnTe3 在较低能量处具有很强的电子损耗共振,这意味着它与电子具有很强的相互作用。
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来源期刊
CiteScore
2.50
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
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