Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes

IF 2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Samuel Parent;Frédéric Vachon;Valérie Gauthier;Steve Lamoureux;Alexandre Paquette;Jacob Deschamps;Tommy Rossignol;Nicolas Roy;Philippe Arsenault;Henri Dautet;Serge A. Charlebois;Jean-François Pratte
{"title":"Wafer-Level Characterization and Monitoring Platform for Single-Photon Avalanche Diodes","authors":"Samuel Parent;Frédéric Vachon;Valérie Gauthier;Steve Lamoureux;Alexandre Paquette;Jacob Deschamps;Tommy Rossignol;Nicolas Roy;Philippe Arsenault;Henri Dautet;Serge A. Charlebois;Jean-François Pratte","doi":"10.1109/JEDS.2024.3359088","DOIUrl":null,"url":null,"abstract":"When developing a technology based on single-photon avalanche diodes (SPADs), the SPAD characterization is mandatory to debug, optimize and monitor the microfabrication process. This is especially true for the development of SPAD arrays 3D integrated with CMOS readout electronics, where SPAD testing is required to qualify the process, independently from the final CMOS readout circuit. This work reports on a characterization and monitoring platform dedicated to SPAD testing at die and wafer level, in the context of a 3D SPAD technology development. The platform relies on a dedicated integrated circuit made in a standard CMOS technology and used in different configurations from a prototype printed circuit board (die-level testing) to active probe cards (wafer-level mapping). The platform gives full access to SPAD characteristics in Geiger mode such as the dark noise, photon detection efficiency and timing resolution. The integrated circuit and its configuration are described in detail as well as results obtained on different SPAD test structures. In particular, the dark count rate mapping demonstrates the benefits of testing SPADs at wafer level at the R&D stage.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":null,"pages":null},"PeriodicalIF":2.0000,"publicationDate":"2024-01-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10414786","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10414786/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

When developing a technology based on single-photon avalanche diodes (SPADs), the SPAD characterization is mandatory to debug, optimize and monitor the microfabrication process. This is especially true for the development of SPAD arrays 3D integrated with CMOS readout electronics, where SPAD testing is required to qualify the process, independently from the final CMOS readout circuit. This work reports on a characterization and monitoring platform dedicated to SPAD testing at die and wafer level, in the context of a 3D SPAD technology development. The platform relies on a dedicated integrated circuit made in a standard CMOS technology and used in different configurations from a prototype printed circuit board (die-level testing) to active probe cards (wafer-level mapping). The platform gives full access to SPAD characteristics in Geiger mode such as the dark noise, photon detection efficiency and timing resolution. The integrated circuit and its configuration are described in detail as well as results obtained on different SPAD test structures. In particular, the dark count rate mapping demonstrates the benefits of testing SPADs at wafer level at the R&D stage.
单光子雪崩二极管的晶圆级表征和监控平台
在开发基于单光子雪崩二极管(SPAD)的技术时,必须对 SPAD 进行表征,以调试、优化和监控微加工过程。尤其是在开发与 CMOS 读出电子器件三维集成的 SPAD 阵列时,需要进行 SPAD 测试,以鉴定工艺,而不依赖于最终的 CMOS 读出电路。这项工作报告了在三维 SPAD 技术开发背景下,专门用于芯片和晶圆级 SPAD 测试的表征和监控平台。该平台依靠标准 CMOS 技术制造的专用集成电路,可用于不同的配置,从原型印刷电路板(芯片级测试)到有源探针卡(晶圆级映射)。在盖革模式下,该平台可全面检测 SPAD 的特性,如暗噪声、光子检测效率和定时分辨率。详细介绍了集成电路及其配置,以及在不同 SPAD 测试结构上获得的结果。特别是暗计数率映射显示了在研发阶段在晶圆级测试 SPAD 的优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
IEEE Journal of the Electron Devices Society
IEEE Journal of the Electron Devices Society Biochemistry, Genetics and Molecular Biology-Biotechnology
CiteScore
5.20
自引率
4.30%
发文量
124
审稿时长
9 weeks
期刊介绍: The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信