High-brightness LDP source

Photomask Technology Pub Date : 2023-09-29 DOI:10.1117/12.2687785

Masataka Mamizuka, Teruaki Kawajiri, Koji Suzuki, Yusuke Teramoto, T. Shirai, S. Morimoto, Hidenori Watanabe, A. Nagano, Daisuke Yajima, N. Ashizawa, Kazuya Aoki, Yoshihiko Sato

引用次数: 0

Abstract

The Laser-assisted Discharge-produced Plasma (LDP) EUV source is a system to generate EUV from discharged plasma triggered by laser on one electrode disc which is coated by tin film. The source has been proven as a highly reliable light source in EUVL high volume production. Also, LDP EUV source enables to generate high brightness with relatively larger EUV plasma, which benefits space stability as well as relatively larger plasma power. In this session, the following items will be presented. (1) LDP EUV source configuration and operation sequence. (2) LDP EUV source key performance (3) Stability Improvement (4) Reliability improvement. (5) Sample exposure application

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高亮度 LDP 光源

激光辅助放电产生等离子体（LDP）EUV 光源是一种利用激光在镀锡膜的电极盘上触发放电等离子体产生 EUV 的系统。该光源已被证明是一种非常可靠的光源，可用于 EUVL 的大批量生产。此外，LDP 超紫外光源能够以相对较大的超紫外等离子体产生高亮度，这有利于空间稳定性和相对较大的等离子体功率。本次会议将介绍以下项目。(1) LDP 超紫外源的配置和操作顺序。(2) LDP 超紫外源的关键性能 (3) 稳定性改进 (4) 可靠性改进。(5) 样品曝光应用

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Photomask Technology

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