Richard Beaudry, Md. Iftekharul Islam, A. Amnache, Maurice Delafosse, Luc Fréchette
{"title":"Programmable photomask for photolithography systems","authors":"Richard Beaudry, Md. Iftekharul Islam, A. Amnache, Maurice Delafosse, Luc Fréchette","doi":"10.1117/12.2685213","DOIUrl":null,"url":null,"abstract":"Digital lithography shortens development cycle time. Laser-based lithography is slow and lacks in overlay precision. The DIGITHO programmable photomask fits into standard photolithography steppers without system modifications. It can generate a different mask for each exposure. DIGITHO offers the most cost-effective solution for die-level serialization and fast prototyping to high throughput manufacturing.","PeriodicalId":235881,"journal":{"name":"Photomask Technology","volume":"1 1","pages":"1275111 - 1275111-4"},"PeriodicalIF":0.0000,"publicationDate":"2023-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2685213","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Digital lithography shortens development cycle time. Laser-based lithography is slow and lacks in overlay precision. The DIGITHO programmable photomask fits into standard photolithography steppers without system modifications. It can generate a different mask for each exposure. DIGITHO offers the most cost-effective solution for die-level serialization and fast prototyping to high throughput manufacturing.