Propylene Epoxidation in a Low-Temperature Parallel-Plate Dielectric Barrier Discharge Reactor with Two Frosted Glass Plates: Effects of Separate Propylene Feed

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Nitikorn Ditthawat, Krittiya Pornmai, Malee Santikunaporn, Surantsawadee Kungsanant, Vissanu Meeyoo, Sumaeth Chavadej
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Abstract

The epoxidation reaction of propylene (C3H6) for propylene oxide (PO) production was, for the first time of its kind, investigated in a low-temperature parallel-plate dielectric barrier discharge system with two frosted glass plates and a separate C3H6 feed under ambient condition. For the mixed feed experiments, the maximum PO selectivity was found at a feed molar air-to-C3H6 ratio of 0.5:1, an applied voltage of 7 kV, an input of 550 Hz, and a feed flow rate of the mixed gas of 100 cm3/min (corresponding to a residence time (RT) of 12.1 s). At the optimum operational conditions, a separate C3H6 feed position fraction of 1 (complete separation of C3H6) with total reactant feed flow rate of 100 cm3/min (corresponding to an O2 residence time (RT) of 24.1 s), the greatest propylene oxide selectivity of 16.40% was achevied. The relatively high PO selectivity with very low selectivities for all other products and with the absence of both CO and CO2 obseved in this studied resulted from less active of C3H6 due to the separate feed of C3H6. The C3Hseparate feed is fundamentally responsible for the reduction in all the undesired reactions including cracking, dehydrogenation, coupling, and oxidations of C3H6.

Graphical Abstract

Abstract Image

带两块磨砂玻璃板的低温平行板绝缘屏障放电反应器中的丙烯环氧化反应:单独丙烯进料的影响
我们首次在低温平行板介电阻挡放电系统中研究了丙烯(C3H6)的环氧化反应,该反应用于生产环氧丙烷(PO)。在混合进料实验中,进料中空气与 C3H6 的摩尔比为 0.5:1、外加电压为 7 kV、输入频率为 550 Hz、混合气体的进料流速为 100 cm3/min(相当于 12.1 秒的停留时间 (RT))时,PO 的选择性最大。在最佳操作条件下,C3H6 的单独进料位置分数为 1(C3H6 完全分离),反应物总进料流速为 100 cm3/min(对应氧气停留时间 (RT) 24.1 秒),环氧丙烷选择性最高,达到 16.40%。由于采用了单独的 C3H6 进料,C3H6 的活性较低,因此本研究得出的环氧丙烷选择性相对较高,而所有其他产品的选择性都很低,并且不存在 CO 和 CO2。C3H 分离进料从根本上减少了 C3H6 的裂解、脱氢、偶联和氧化等所有不良反应。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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