The Ultraviolet-B Radiation Characteristics of Planar Excilamps Filled with Gas Mixture of Xenon, Bromine and Chlorine

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2023-11-24 DOI:10.1007/s11090-023-10428-6

Qianwen Zhu, Qiuyi Han, Shanduan Zhang

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引用次数: 0

Abstract

Ultraviolet B radiation (UVB) is widely used in agricultural plant growth and phototherapy. The traditional light sources have a low UVB radiation efficiency, poor uniformity radiation, high energy consumption, and short service lifetime. The multiband XeBr^* and XeCl^* planar excilamps as high-power UVB sources have not been researched in existing studies and the power density of XeBr^*/XeCl^* excilamps reported in the study are not high. This work presents a high-power density planar excilamp of homogeneous dielectric barrier discharge in a mixture of xenon and molecular bromine and chlorine (Xe/Br₂/Cl₂). The spectrum, electrical parameters, total gas pressure, and gas mixture composition, have been analyzed. For the multiband excilamp filled with Xe/Br₂/Cl₂, it has been demonstrated that the maximum UVB and total radiant efficiency is 7.9% and 9.7% with optimal chlorine ratio of 0.1% and the bromine ratio ranging from 0.1 to 0.2%, with the input power of 138 W at the total pressure of gas mixture of 200 mbar. This work has confirmed that the percentage of bromine molecules must be higher than the percentage of chlorine by a factor of about 2.6 to achieve the same intensities of the XeBr^* 282 nm and XeCl^* 308 nm bands. These results allow to find out the optimum radiation efficiency of multiband excilamps with a large planar geometry to meet the requirement of UVB industrial applications.

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氙、溴、氯混合气体填充平面激光灯的紫外- b辐射特性

紫外线B辐射(UVB)在农业植物生长和光治疗中有着广泛的应用。传统光源UVB辐射效率低，辐射均匀性差，能耗高，使用寿命短。现有研究尚未对多波段XeBr*和XeCl*平面激波作为大功率UVB源进行研究，本研究报道的XeBr*/XeCl*激波的功率密度不高。本文提出了一种高功率密度的均匀介质阻挡放电平面激光放大器，用于氙和分子溴和氯(Xe/Br2/Cl2)的混合介质。分析了光谱、电气参数、总气体压力和混合气体成分。对于Xe/Br2/Cl2填充的多波段激光灯，在混合气总压为200 mbar、输入功率为138 W、氯比为0.1%、溴比为0.1 ~ 0.2%的条件下，最大UVB和总辐射效率分别为7.9%和9.7%。这项工作证实，溴分子的百分比必须比氯的百分比高出约2.6倍，才能达到XeBr* 282 nm和XeCl* 308 nm波段的相同强度。这些结果有助于找出具有大平面几何形状的多波段激光放大器的最佳辐射效率，以满足UVB工业应用的要求。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.