Characteristics and Stability of Pulsed Gas–Liquid Discharge with the Addition of Photocatalysts

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2023-11-23 DOI:10.1007/s11090-023-10426-8

Yuankun Ye, Zikai Zhou, Sen Wang, Zhi Fang

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Abstract

Gas–liquid discharge coupling with photocatalysts is an effective approach to enhance the chemical activity of plasma treated liquid. However, the incomplete understanding of the discharge characteristics with the addition of photocatalysts remain. The characteristics of pulsed gas–liquid discharge combining TiO₂ or WO₃ are studied in this work to address this issue. Results indicate that the addition of photocatalysts significantly promote the discharge, as evidenced by the diagnosis of discharge current, optical emission spectra, concentrations of aqueous species and solution properties. Specifically, the addition of catalysts enhances the discharge current and enrich the emission spectrum. The atomic emission lines O (3p–3s), N (3p–3s) and H_α were also observed with the addition of TiO₂, followed by higher content of reactive species in the solution. However, the addition of catalysts makes the discharge more unstable. This study contributes to an improved understanding of the mechanism of gas–liquid discharge coupled with photocatalysts for the improvement in applications.

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光催化剂作用下脉冲气液放电的特性及稳定性

光催化剂耦合气液放电是提高等离子体处理液体化学活性的有效途径。然而，对光催化剂的加入对其放电特性的了解还不完全。为了解决这一问题，本文研究了TiO2或WO3复合脉冲气液放电的特性。结果表明，光催化剂的加入对放电有明显的促进作用，包括对放电电流、发射光谱、水溶液浓度和溶液性质的诊断。具体来说，催化剂的加入增强了放电电流，丰富了发射光谱。随着TiO2的加入，溶液中O (3p-3s)、N (3p-3s)和Hα的原子发射谱线也随之增加。然而，催化剂的加入使放电更加不稳定。本研究有助于加深对气液耦合光催化剂作用机理的认识，提高光催化剂的应用水平。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.