Correction to: Generation of Multiple Jet Capillaries in Advanced Dielectric Barrier Discharge for Large‑Scale Plasma Jets

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2023-11-30 DOI:10.1007/s11090-023-10432-w

Duc Ba Nguyen, Shirjana Saud, Quang Thang Trinh, Hongjie An, Nam‑Trung Nguyen, Quang Hung Trinh, Hoang Tung Do, Young Sun Mok, Won Gyu Lee

引用次数: 0

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修正:在大型等离子体射流的先进介质阻挡放电中产生多个喷射毛细血管

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.