Jiashuo Wang, Lisong Dong, Xiaojing Su, Yajuan Su, Xu Ma, Yayi Wei
{"title":"Selection approach of critical patterns for calibrating the physical resist model based on spectrum coverage","authors":"Jiashuo Wang, Lisong Dong, Xiaojing Su, Yajuan Su, Xu Ma, Yayi Wei","doi":"10.1117/1.jmm.22.4.043201","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":499761,"journal":{"name":"Journal of micro/nanopatterning, materials, and metrology","volume":"40 5","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of micro/nanopatterning, materials, and metrology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/1.jmm.22.4.043201","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}