Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Jennifer Stefani Weber, Vanessa Piroli, Michael Cristian Goldbeck, Bruna Louise Perotti, Carla Daniela Boeira, Newton Kiyoshi Fukumasu, Alexandre Fassini Michels, Carlos Alejandro Figueroa
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引用次数: 0

Abstract

Diamondlike carbon (DLC) coatings provide interesting properties for industrial applications. However, the low adhesion of DLC coatings on any type of ferrous alloy compromises technological applications. One possible solution to this issue is the application of adhesion interlayers. The aim of this study is to investigate the adhesion of DLC films on low-alloy steel through the use of silicon-containing interlayers at different deposition times using tetramethylsilane. The role of time on the physical-chemical, microstructural, and tribological properties of the material system was evaluated. The interlayer thickness linearly increased and greater contributions of silicon bonds were measured as a function of the interlayer deposition time. Nevertheless, longer deposition times increased the roughness and defect ratio in DLC coatings. Although good enough adhesion for decorative applications was acquired, no drastic variation in the average critical load (∼4.2 N) for delamination was observed at different deposition times for the samples that achieved adhesion.
含硅中间层采用四甲基硅烯对类金刚石碳膜在低合金钢上的粘附作用:中间层沉积时间的作用
类金刚石碳(DLC)涂层为工业应用提供了有趣的性能。然而,DLC涂层在任何类型的铁合金上的低附着力损害了技术应用。一个可能的解决方案是应用粘合中间层。本研究的目的是通过使用含硅中间层在不同沉积时间使用四甲基硅烷来研究DLC薄膜在低合金钢上的附着力。评估了时间对材料系统的物理化学、微观结构和摩擦学性能的影响。层间厚度线性增加,硅键的贡献随层间沉积时间的增加而增加。然而,较长的沉积时间增加了DLC涂层的粗糙度和缺陷率。虽然在装饰应用中获得了足够好的附着力,但在不同的沉积时间中,对于获得附着力的样品,没有观察到分层的平均临界载荷(~ 4.2 N)的剧烈变化。
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来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
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