Effect of nitrogen pressure on the fabrication of AlCrFeCoNiCu0.5 high entropy nitride thin films via cathodic arc deposition

Abstract

In the past two decades, high entropy alloy (HEA) coatings have attracted great attention due to their superior mechanical properties, outstanding corrosion and oxidation resistance, and exceptionally high thermal stability. In comparison to HEA thin films, high entropy nitrides (HENs) exhibit higher mechanical strength and chemical inertness. In this work, AlCrFeCoNiCu0.5 HEA and HEN thin films were fabricated using a filtered cathodic arc. By regulating the deposition pressure from 0.0005 Pa (HEA thin film) to 0.05 Pa, the nitrogen concentration in each thin film was precisely controlled to tune the mechanical properties. Scanning transmission electron microscopy-energy dispersive spectroscopy revealed that the nitrogen concentration of the films was up to 21.2 at. % at the pressure of 0.05 Pa. The reduced effect of preferential sputtering increased aluminum concentration from 8.3 ± 1.5 to 12.9 ± 2.2 at. % as pressure increased up to 0.05 Pa. X-ray photoelectron spectroscopy further confirmed the formation of AlN and CrN at pressures of 0.01–0.05 Pa. The highest hardness and elastic modulus of the HEN film were 12.4 ± 0.6 and 347.3 ± 17.7 GPa, respectively, which were 84.8% and 131.4% higher than those of the HEA thin film.