Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Esteban Broitman, Yuri Kadin, Predrag Andric
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Abstract

In this work, we first review the previous work done on statistical nanoindentation by different researchers, highlighting the main problems that have been found and possible proposed solutions. In the second part, we study and report the statistical nanoindentation of three model samples, in the form of a soft Al2124 matrix embedded with hard SiC particles. Three different variants were selected: (1) 25% of SiC particles with 3 μm diameter; (2) 25% of SiC particles with 0.7 μm diameter; and (3) 17% of SiC particles with 0.3 μm diameter. We propose a novel heuristic wavelet technique to filter the measurement noise from the raw nanoindentation data as an attempt to obtain a more robust statistical nanoindentation methodology. Our results have shown that, when the nanoindentation data are filtered, it is not necessary to select a priori the number of peaks (phases) to be analyzed and, in some cases, a wide number of bin-sizes can be used without affecting the results. Finally, a finite element modeling have been used to analyze the response of the nanoindenter regarding the position of the hard particle. Our model shows that it is impossible to get the whole hardness value of the hard SiC particle by the statistical nanoindentation methodology.
基于改进统计纳米压痕方法的Al2124-SiC纳米复合材料研究
在这项工作中,我们首先回顾了不同研究人员在统计纳米压痕方面所做的工作,重点介绍了已经发现的主要问题和可能提出的解决方案。在第二部分中,我们研究并报告了三种模型样品的统计纳米压痕,其形式是软Al2124基体嵌入硬SiC颗粒。选择三种不同的变体:(1)25%的直径为3 μm的SiC颗粒;(2)粒径0.7 μm的SiC颗粒25%;(3)直径0.3 μm的SiC颗粒占17%。我们提出了一种新的启发式小波技术来过滤原始纳米压痕数据中的测量噪声,以获得更鲁棒的统计纳米压痕方法。我们的结果表明,当纳米压痕数据被过滤时,没有必要先验地选择要分析的峰(相)的数量,并且在某些情况下,可以使用大量的桶尺寸而不影响结果。最后,利用有限元模型分析了纳米压头对硬颗粒位置的响应。我们的模型表明,统计纳米压痕方法不可能得到硬质碳化硅颗粒的全部硬度值。
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来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
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