Band-engineered LaFeO3–LaNiO3 thin film interfaces for electrocatalysis of water

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Rajendra Paudel, Andricus R. Burton, Marcelo A. Kuroda, Byron H. Farnum, Ryan B. Comes
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Abstract

Iron and nickel-based perovskite oxides have proven promising for the oxygen evolution reaction (OER) in alkaline environments, as their catalytic overpotentials rival precious metal catalysts when the band alignment is tuned through substitutional doping or alloying. Here, we report the engineering of band alignment in LaFeO3/LaNiO3 (LFO/LNO) heterostructures via interfacial doping that yields greatly enhanced catalytic performance. The 0.2 eV offset (VBO) between the Fermi level in metallic LNO and the valence band in semiconducting LFO that we predict using density functional theory makes LFO a p-type semiconductor, resulting in significantly lower barriers for hole transport through LFO compared to the intrinsic material. Experimental band alignment measured with in situ x-ray photoelectron spectroscopy of epitaxial LFO/LNO heterostructures confirms these predictions, producing a measured VBO of 0.3(1) eV. Furthermore, OER catalytic measurements on these samples in the alkaline solution show an increase in catalytic current density by a factor of ∼275 compared to LFO grown on n-type Nb-doped SrTiO3. These results demonstrate the power of tuning band alignments through interfacial band engineering for improved catalytic performance of oxides.
用于水电催化的LaFeO3-LaNiO3薄膜界面
铁基钙钛矿和镍基钙钛矿氧化物在碱性环境下的出氧反应(OER)被证明是有前途的,因为当通过取代掺杂或合金化调整能带排列时,它们的催化过电位可以与贵金属催化剂相竞争。在这里,我们报道了通过界面掺杂在LaFeO3/LaNiO3 (LFO/LNO)异质结构中进行能带排列的工程,从而大大提高了催化性能。我们利用密度泛函理论预测的金属LNO中的费米能级与半导体LFO中的价带之间的0.2 eV偏移(VBO)使LFO成为p型半导体,与本征材料相比,LFO中的空穴输运势垒显著降低。用外延LFO/LNO异质结构的x射线光电子能谱测量的实验波段对准证实了这些预测,产生了0.3(1)eV的测量VBO。此外,在碱性溶液中对这些样品进行的OER催化测量表明,与在n型nb掺杂SrTiO3上生长的LFO相比,催化电流密度增加了约275倍。这些结果证明了通过界面带工程调整能带排列对改善氧化物催化性能的作用。
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来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
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