{"title":"Surface structural analysis of CaF2(111) using low-energy atom scattering spectroscopy","authors":"Hiroaki Fukuta, Goon Tan, Tomoaki Oga, Akifumi Matsuda, Mamoru Yoshimoto, Kenji Umezawa","doi":"10.1116/6.0002392","DOIUrl":null,"url":null,"abstract":"We determined the surface structure of cleaved CaF2(111) via atomic force microscopy and low-energy atom scattering spectroscopy for surface analyses of insulators. A pulsed 3 keV-20Ne0 impinged on the sample. The backscattered particles were detected at a scattering angle of 180°. It was found that (1) fluorine atoms dominated the topmost surfaces of cleaved CaF2(111) and (2) the topmost layer of fluorine atoms was located at an inward shift of 0.2 Å with respect to the bulk lattice structure.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"96 1","pages":"0"},"PeriodicalIF":2.4000,"publicationDate":"2023-05-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0002392","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
We determined the surface structure of cleaved CaF2(111) via atomic force microscopy and low-energy atom scattering spectroscopy for surface analyses of insulators. A pulsed 3 keV-20Ne0 impinged on the sample. The backscattered particles were detected at a scattering angle of 180°. It was found that (1) fluorine atoms dominated the topmost surfaces of cleaved CaF2(111) and (2) the topmost layer of fluorine atoms was located at an inward shift of 0.2 Å with respect to the bulk lattice structure.
期刊介绍:
Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.