Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Daisuke Ogawa, Keiji Nakamura
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Abstract

This article reports a possible functionalization mechanism of isocyanate (NCO) groups on multiwalled carbon nanotubes (CNTs) with low-temperature plasma. The mechanism was clarified according to the analysis with two plasmas generated with the gas mixture of (1) nitrogen and carbon dioxide and (2) nitrogen and oxygen. We analyzed the mechanism through optical emission spectroscopy from these plasmas and the NCO functionalization ratio measured with the fluorescent method after plasma exposure over CNTs. The optical emission gave us information on the quantitative analysis of the gas species of atomic nitrogen (N), atomic oxygen (O), and carbon monoxide (CO) and the qualitative analysis of carbon nitride (CN) species in the plasma. Compared with our results from the gas species in the plasma and the NCO functionalization ratio on CNTs, CO and CN species in the gas phase in plasma are less likely to contribute to forming NCO groups on CNTs. Rather, the equal densities of atomic nitrogen and oxygen species in the plasma could be effective in forming NCO groups on the CNT surface: the NCO groups should form by N, O, and carbon (C) species on the CNT surface. The groups likely build up gradually by N, O, and C individually reaching a CNT surface, or the NCO radicals form in the gas phase and then attach to the CNT surface.
多壁碳纳米管上异氰酸酯基团的等离子体功能化机制
本文报道了异氰酸酯(NCO)基团在低温等离子体多壁碳纳米管(CNTs)上可能的功能化机制。通过(1)氮气与二氧化碳和(2)氮气与氧气混合气体产生的两个等离子体的分析,阐明了其机理。我们通过这些等离子体的光学发射光谱分析了其机理,并通过荧光法测量了等离子体暴露在碳纳米管上后的NCO功能化率。光发射为等离子体中原子氮(N)、原子氧(O)和一氧化碳(CO)气体种类的定量分析和氮化碳(CN)气体种类的定性分析提供了信息。与我们在等离子体中的气体种类和NCO在CNTs上的官能化比的结果相比,等离子体中气相中的CO和CN种类不太可能在CNTs上形成NCO基团。相反,等离子体中原子氮和原子氧的密度相等可以有效地在碳纳米管表面形成NCO基团:NCO基团应该由碳纳米管表面的N、O和碳(C)种形成。这些基团可能是由N、O和C分别到达碳纳米管表面逐渐形成的,或者NCO自由基在气相形成,然后附着在碳纳米管表面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
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