Gas–Liquid Chemical Reactions with Nanosecond Pulses: Role of Frequency and Pulse Delivery Modes

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Radha Krishna Murthy Bulusu, Nina Mihajlov, Christopher W. Patterson, Robert J. Wandell, Bruce R. Locke
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引用次数: 1

Abstract

The effects of changes in the mode of delivery of nanosecond pulses in a gas–liquid plasma reactor on the formation of hydrogen peroxide, H2O2, and, as an indicator for ·OH radicals, the decoloration of methylene blue, MB, were determined for pulse delivery by (a) increasing frequency with uniform pulses (5–50 kHz), (b) variation of the time between bursts of pulses (burst period), (c) changing the inner burst frequency (1 over the time between the pulses in the burst), and (d) variation of number of pulses in a burst (N-cycles). H2O2 peroxide formation was not affected by the method of pulse delivery in the range of parameters studied here and all data followed an approximately linear increase in H2O2 production rate with discharge power. In contrast, the MB decoloration rate was affected by the burst modes. In terms of discharge power, the MB decoloration rate was highest for the uniform pulse mode; however, the linear trend in increase of MB decoloration with power when the burst period was varied, suggest that at higher power the burst mode may be more effective than the uniform pulsing. Consideration of the per pulse decoloration with energy per pulse and with number of pulses suggest that the burst mode can affect reactions differently from applying a uniform pulse.

Abstract Image

纳秒脉冲的气液化学反应:频率和脉冲传递模式的作用
在气液等离子体反应器中,纳秒脉冲传输方式的变化对过氧化氢H2O2的形成以及作为·OH自由基指示器的亚甲基蓝MB的脱色的影响,通过(a)增加均匀脉冲频率(5-50 kHz), (b)脉冲爆发间隔时间(爆发周期)的变化,(c)改变内部爆发频率(1除以爆发中脉冲之间的时间)来确定脉冲传输。(d)脉冲数变化(n个周期)。在本文研究的参数范围内,脉冲输送方式对过氧化氢的形成没有影响,所有数据都遵循H2O2产率随放电功率近似线性增加的规律。相比之下,MB脱色率受爆发模式的影响。放电功率方面,均匀脉冲模式下MB脱色率最高;然而,随着脉冲周期的变化,MB脱色率随功率的增加呈线性趋势,这表明在较高的功率下,脉冲脱色比均匀脉冲脱色更有效。考虑每脉冲能量和脉冲数对每脉冲脱色的影响,表明爆发模式对反应的影响不同于施加均匀脉冲。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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