T. Sawada, K. Yoshikawa, H. Takata, K. Nii, M. Nagata
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引用次数: 5
Abstract
SRAM exhibits the sensitivity of false operation against static and sinusoidal supply voltage variation. A measurement system combines direct radio frequency (RF) power injection, on-chip monitoring of voltage variation on power supply lines, and built-in self test of memory read/write operations. The bit error rate (BER) of an SRAM core exponentially increases when the lowest instantaneous voltage on the power supply line of SRAM cells during RF injection linearly decreases. Test dice on wafers at five different process corners in a 1.5 V 90 nm CMOS technology were tested. The minimum allowable voltage with BER of less than a single bit failure in average becomes smaller, thus more tolerant, when n-channel devices are at the slow corner in a conventional 6-transistor SRAM cell. The measurement technique enables to experimentally evaluate dynamic noise margin of SRAM cores in a given technology.
SRAM对静态和正弦电源电压变化具有误操作的敏感性。测量系统结合了直接射频(RF)功率注入,对电源线路电压变化的片上监测,以及存储器读/写操作的内置自检。当SRAM单元在射频注入过程中电源线上的最低瞬时电压线性降低时,SRAM核心的误码率(BER)呈指数增长。在1.5 V 90 nm CMOS技术下,测试了5个不同工艺角的晶圆上的测试片。在传统的6晶体管SRAM单元中,当n通道器件处于慢角时,平均误码率小于单个位失效的最小允许电压变得更小,因此更具有容忍度。该测量技术能够对给定技术下SRAM核的动态噪声裕度进行实验评估。