{"title":"Synthesis of high-transmittance zinc oxide by oxidation of evaporated zinc films","authors":"Jiesheng Zhang, K. Iwamaru, Kazuhiro Nakamura","doi":"10.1109/IMFEDK.2013.6602255","DOIUrl":null,"url":null,"abstract":"ZnO films were prepared on glass substrates by two different methods. One is a spin-coating method followed by annealing in oxygen gas. The other is an evaporation of zinc metal followed by oxidation. The crystal structure was characterized by X-ray diffraction. The optical transmittance was recorded by a spectrophotometer in the visible range (400-800nm). It was found that the normalized optical transmittances of the ZnO films prepared using vacuum evaporation method were over 90% which were much larger than those of the films using spin-coating method.","PeriodicalId":434595,"journal":{"name":"2013 IEEE International Meeting for Future of Electron Devices, Kansai","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE International Meeting for Future of Electron Devices, Kansai","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMFEDK.2013.6602255","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
ZnO films were prepared on glass substrates by two different methods. One is a spin-coating method followed by annealing in oxygen gas. The other is an evaporation of zinc metal followed by oxidation. The crystal structure was characterized by X-ray diffraction. The optical transmittance was recorded by a spectrophotometer in the visible range (400-800nm). It was found that the normalized optical transmittances of the ZnO films prepared using vacuum evaporation method were over 90% which were much larger than those of the films using spin-coating method.