Copper pillar bump structure optimization for flip chip packaging with Cu/Low-K stack

X.R. Zhang, W.H. Zhu, B. P. Liew, M. Gaurav, A. Yeo, K.C. Chan
{"title":"Copper pillar bump structure optimization for flip chip packaging with Cu/Low-K stack","authors":"X.R. Zhang, W.H. Zhu, B. P. Liew, M. Gaurav, A. Yeo, K.C. Chan","doi":"10.1109/ESIME.2010.5464565","DOIUrl":null,"url":null,"abstract":"Copper pillar bumping is a promising solution to cope with the challenges which flip chip packages face when bump pitch size keep shrinking. A large FCBGA(flip chip ball grid array) package for 45nm Cu/Low-K device with Cu pillar bumps is chosen to investigate the package reliability. Finite element models have been built with multi-level sub-modeling technique to consider the detailed Cu/Low-K structure in the chip. Comparison on Cu pillar bumps vs. solder bumps shows the former bump type generated about 20∼30% higher stress on Cu/lowK structure. Thus package reliability may become a concern when Cu pillar is used. To improve the package reliability, design optimization is carried out on Cu pillar bump structure. DOE (design of experiment) study is done on the following factors: Cu pillar height, PI (polyimide) passivation opening and PI thickness etc. Loading is considered for both post flip chip attach process (reflow) and after full assembly (curing). It is found that the stress in post flip chip attach process is much higher than that after full assembly. For Cu/low-K devices, special care is needed for flip chip attach process. Stress on Cu/low-K interface has been analyzed in detail, and it is shown that the interface stress pattern is highly dependent on UBM structure design, especially PI opening and thickness. An overall picture of the PI effect is presented based on optimization results. Lower Cu pillar height, smaller PI opening and higher thickness are recommended for bump structure design.","PeriodicalId":152004,"journal":{"name":"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"19","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESIME.2010.5464565","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 19

Abstract

Copper pillar bumping is a promising solution to cope with the challenges which flip chip packages face when bump pitch size keep shrinking. A large FCBGA(flip chip ball grid array) package for 45nm Cu/Low-K device with Cu pillar bumps is chosen to investigate the package reliability. Finite element models have been built with multi-level sub-modeling technique to consider the detailed Cu/Low-K structure in the chip. Comparison on Cu pillar bumps vs. solder bumps shows the former bump type generated about 20∼30% higher stress on Cu/lowK structure. Thus package reliability may become a concern when Cu pillar is used. To improve the package reliability, design optimization is carried out on Cu pillar bump structure. DOE (design of experiment) study is done on the following factors: Cu pillar height, PI (polyimide) passivation opening and PI thickness etc. Loading is considered for both post flip chip attach process (reflow) and after full assembly (curing). It is found that the stress in post flip chip attach process is much higher than that after full assembly. For Cu/low-K devices, special care is needed for flip chip attach process. Stress on Cu/low-K interface has been analyzed in detail, and it is shown that the interface stress pattern is highly dependent on UBM structure design, especially PI opening and thickness. An overall picture of the PI effect is presented based on optimization results. Lower Cu pillar height, smaller PI opening and higher thickness are recommended for bump structure design.
铜/低钾堆倒装封装铜柱凸点结构优化
铜柱碰撞是一种很有前途的解决方案,可以应对倒装芯片封装在碰撞间距不断缩小的情况下所面临的挑战。采用大型FCBGA(倒装芯片球栅阵列)封装45nm Cu/Low-K器件,研究了封装的可靠性。采用多级子建模技术建立了考虑芯片中Cu/Low-K结构的有限元模型。铜柱凸起与焊料凸起的比较表明,前者凸起对Cu/lowK结构产生的应力高出约20 ~ 30%。因此,当使用铜柱时,封装可靠性可能成为一个问题。为提高封装可靠性,对铜柱凸包结构进行了优化设计。实验设计对铜柱高度、聚酰亚胺钝化开口、钝化厚度等因素进行了研究。加载是考虑后倒装芯片的附加过程(回流)和后组装(固化)。研究发现,倒装芯片后贴装过程中的应力要比完全组装后的应力大得多。对于Cu/低k器件,需要特别注意倒装芯片的连接过程。对Cu/低k界面应力进行了详细分析,结果表明,界面应力分布模式高度依赖于UBM结构设计,特别是PI开度和厚度。基于优化结果,给出了PI效应的全貌。凸块结构设计建议采用较低的铜柱高度,较小的PI开口,较高的厚度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信