Sung-Jip Kim, K. Lee, Jong-In Yim, Hyunjoong Kim, Sukwhan Kim, S. Shin, W. Choi, Jinhee Jung, Kyungwha Chun, Inja Lee, Jooyoung Lee, Hyeongsun Hong, Gyoyoung Jin
{"title":"A study of reticle CD behavior for inter-area pattern loading difference","authors":"Sung-Jip Kim, K. Lee, Jong-In Yim, Hyunjoong Kim, Sukwhan Kim, S. Shin, W. Choi, Jinhee Jung, Kyungwha Chun, Inja Lee, Jooyoung Lee, Hyeongsun Hong, Gyoyoung Jin","doi":"10.1117/12.2196988","DOIUrl":null,"url":null,"abstract":"We can control the pattern on wafer without optimization of layout design if we understand reticle cd behavior","PeriodicalId":308777,"journal":{"name":"SPIE Photomask Technology","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2196988","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We can control the pattern on wafer without optimization of layout design if we understand reticle cd behavior
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
