Application for WLP at positive working photosensitive polybenzoxazole

T. Hirano, K. Yamamoto, K. Imamura
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引用次数: 8

Abstract

A positive working photosensitive polybenzoxazole (PBO) for use as a semiconductor surface coating material has been developed. This material has been widely used as a buffer coating to protect electrical circuitry on IC chips in the semiconductor market. We have now developed a new positive working photosensitive PBO for Wafer Level Packaging (WLP). These cured PBO films have very low water absorption and low dielectric constant in addition to high adhesion to a wide range of substrates including SiO2, etc. Additionally, the patterned profile of the developed and cured film has the desired taper shape, which makes these materials suitable as the interlayer dielectric film for WLP.
WLP在正极工作光敏聚苯并恶唑中的应用
研制了一种正工作型光敏聚苯并恶唑(PBO)半导体表面涂层材料。在半导体市场上,这种材料被广泛用作保护IC芯片电路的缓冲涂层。我们现在已经开发出一种用于晶圆级封装(WLP)的新型正工作光敏PBO。这些固化的PBO薄膜具有非常低的吸水率和低介电常数,并且对包括SiO2等在内的各种衬底具有很高的附着力。此外,开发和固化膜的图案化轮廓具有所需的锥度形状,这使得这些材料适合作为WLP的层间介电膜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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