EUVL: the natural evolution of optical microlithography

Abstract

EUV Lithography is ready for High Volume Production, further enabling the printing of ever smaller features. In this keynote, the author will briefly reflect on evolution and future of digital technologies. An overview of the development and major milestones of Lithography lenses – with aberrations being a main focus – from the mid 1990 to today will be presented. Other aspects – like mask 3D effects, Source Mask Optimization, High NA EUV and Stochastic will be discussed.