A large displacement piezodriven silicon XY-microstage

Abstract

This paper present the fabrication and integration processes employed in order to realize the Si-PZT hybrid XY-microstage. A silicon XY-microstage with dimensions of 20×20×0.4 mm containing Moonie amplification mechanisms is fabricated and evaluated. The experimental results show that this microstage containing a commercial PZT actuator and Moonie angle of 2 degrees produced a displacement of 82 µm and 60 µm at 70 V for the X and Y directions, respectively. The fabricated microstage demonstrates that the designed amplification mechanism is able to magnify the stroke up to 18 times.