Peter Yi-Yu Liao, Katherine Shu-Min Li, L. Chen, Sying-Jyan Wang, Andrew Yi-Ann Huang, Ken Chau-Cheung Cheng, Nova Cheng-Yen Tsai, Leon Chou
{"title":"WGrid: Wafermap Grid Pattern Recognition with Machine Learning Techniques","authors":"Peter Yi-Yu Liao, Katherine Shu-Min Li, L. Chen, Sying-Jyan Wang, Andrew Yi-Ann Huang, Ken Chau-Cheung Cheng, Nova Cheng-Yen Tsai, Leon Chou","doi":"10.1109/ITC50571.2021.00043","DOIUrl":null,"url":null,"abstract":"Wafer map defect pattern recognition provides a visual way for root cause analysis and yield learning. Specially, recognizing grid, including line and intersection point types in wafer defect patterns is a challenging problem for process and test engineers. Grid is a repeating defect pattern that appears in multiple wafers, so identifying such patterns helps to trace the root cause of defects for yield ramp up. In this paper, we propose a grid pattern recognition methodology taking into account both partial and hidden grid patterns. Hidden defective dies are dies in the grid contour that pass wafer test. However, such dies may suffer from latent and leakage faults, which usually deteriorate quickly and need to be screened by burn-in test to improve quality. A possible solution is to locate the potential defective dies in hidden grid patterns and mark them as faulty. As a result, the reliability of products and test cost can be significantly improved. In this paper, we propose a systematic methodology to search for hidden grid patterns in wafers. A five-phase method is developed to enhance wafer maps such that automatic defect pattern recognition can be carried with high accuracy. Experimental results show the proposed method can achieve 100% prediction accuracy for all grid types, and also achieve 96.45% by Extremely Randomized Trees for all nine common wafer defect types averagely.","PeriodicalId":147006,"journal":{"name":"2021 IEEE International Test Conference (ITC)","volume":"51 ","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE International Test Conference (ITC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ITC50571.2021.00043","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Wafer map defect pattern recognition provides a visual way for root cause analysis and yield learning. Specially, recognizing grid, including line and intersection point types in wafer defect patterns is a challenging problem for process and test engineers. Grid is a repeating defect pattern that appears in multiple wafers, so identifying such patterns helps to trace the root cause of defects for yield ramp up. In this paper, we propose a grid pattern recognition methodology taking into account both partial and hidden grid patterns. Hidden defective dies are dies in the grid contour that pass wafer test. However, such dies may suffer from latent and leakage faults, which usually deteriorate quickly and need to be screened by burn-in test to improve quality. A possible solution is to locate the potential defective dies in hidden grid patterns and mark them as faulty. As a result, the reliability of products and test cost can be significantly improved. In this paper, we propose a systematic methodology to search for hidden grid patterns in wafers. A five-phase method is developed to enhance wafer maps such that automatic defect pattern recognition can be carried with high accuracy. Experimental results show the proposed method can achieve 100% prediction accuracy for all grid types, and also achieve 96.45% by Extremely Randomized Trees for all nine common wafer defect types averagely.