Design of low-leakage power-rail ESD clamp circuit with MOM capacitor and STSCR in a 65-nm CMOS process

Po-Yen Chiu, M. Ker
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引用次数: 11

Abstract

A power-rail electrostatic discharge (ESD) clamp circuit designed with low-leakage consideration has been proposed and verified in a 65-nm low-voltage CMOS process. By using the metal-oxide-metal (MOM) capacitor in the ESD-detection circuit, the power-rail ESD clamp circuit realized with only thin-oxide (1-V) devices has very low stand-by leakage current, as compared to the traditional design. The experimental results in the silicon chip showed that the standby leakage current is only 358 nA at room temperature (25 °C) under the power-supply voltage of 1 V, whereas the traditional design realized with the NMOS capacitor is as high as 828 µA under the same bias condition.
基于65纳米CMOS工艺的MOM电容和STSCR低漏功率轨ESD箝位电路设计
提出了一种考虑低漏电的电源轨静电放电(ESD)箝位电路,并在65nm低压CMOS工艺中进行了验证。通过在ESD检测电路中使用金属-氧化物-金属(MOM)电容,与传统设计相比,仅使用薄氧化物(1-V)器件实现的电源导轨ESD钳位电路具有非常低的待机泄漏电流。在硅片上的实验结果表明,在1 V电源电压下,在室温(25℃)下待机漏电流仅为358 nA,而在相同偏置条件下,采用NMOS电容实现的传统设计高达828µA。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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