High tolerance operation of 1T/2C FeRAMs for the variation of cell capacitors characteristics

N. Tanabe, S. Kobayashi, T. Miwa, K. Amamuma, H. Mori, N. Inoue, T. Takeuchi, S. Saitoh, Y. Hayashi, J. Yamada, H. Koike, H. Hada, T. Hunio
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引用次数: 8

Abstract

The operation of an FeRAM test chip is demonstrated with an 8 kbit cell array, sense amplifiers and other peripheral circuits for confirming the high tolerance of the 1T/2C FeRAM. The test chip is successfully fabricated by using a double layer metal process. The voltage difference to be amplified in data read for the 1T/2C FeRAM is 86 mV, which is large enough to operate, and four times larger than that for conventional 1T/1C FeRAM, after the cell capacitors characteristics are degraded and varied.
1T/2C feram对电池电容特性变化的高容忍度操作
用8kbit单元阵列、感测放大器和其他外围电路演示了FeRAM测试芯片的工作,以确认1T/2C FeRAM的高容限。采用双层金属工艺成功制备了测试芯片。对于1T/2C FeRAM,在电池电容器特性退化和变化后,数据读取中放大的电压差为86 mV,足以运行,是传统1T/1C FeRAM的四倍。
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