On the variability of threshold voltage window in gate-injection versatile memories with Sub-60mV/dec subthreshold swing and 1012-cycling endurance

Y. Chiu, Chun-Yen Chang, S. Yen, C. Fan, H. Hsu, Chun‐Hu Cheng, Po‐Chun Chen, Po-Wei Chen, G. Liou, Min-Hung Lee, Chien Liu, Wu-Ching Chou
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引用次数: 6

Abstract

Incorporating a charge-trapped ZrSiO with ferroelectric HfZrO dielectrics, we demonstrated a gate-injection versatile memory with sub-60mV/dec subthreshold swing (SS) and large threshold voltage window (ΔVT) of >2V under a fast 20-ns speed. Moreover, it is revealed that the local defects at ZrSiO/HfZrO interface affect the ferroelectric negative capacitance tuning and thus increases the variability of VT and SS during 1012 cycling endurance.
亚阈值摆幅低于60mv /dec的门注入通用存储器中阈值电压窗的可变性
结合电荷捕获ZrSiO和铁电HfZrO介电体,我们展示了一种栅极注入通用存储器,在20-ns的快速速度下,具有低于60mv /dec的亚阈值摆幅(SS)和>2V的大阈值电压窗(ΔVT)。此外,ZrSiO/HfZrO界面处的局部缺陷影响了铁电负电容调谐,从而增加了1012次循环时VT和SS的变异性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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