Optimization of doping concentration for three-dimensional bulk silicon microrefrigerators

Yan Zhang, G. Zeng, A. Shakouri, Peng Wang, Bao Yang, A. Bar-Cohen
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引用次数: 1

Abstract

We designed and fabricated a three-dimensional (3D) silicon microrefrigerator, which demonstrates a cooling power density over 200W/cm with only ~1degC cooling. The high cooling power density is mainly due to the high thermal conductivity and heat spreading effects. These devices have potential application in hot-spots management to reduce the chip peak temperature and realize on chip thermal management. A finite element model is developed to study and optimize these 3D devices. The simulation results showed that the optimized doping concentration to achieve the maximum cooling for these 3D silicon microrefrigerators (5e18 cm-3) is different from the conventional ID device, where S2sigma achieves the maximum at the doping of 5e19 cm-3. At its optimized doping concentration, these silicon microrefrigerators could reach a maximum cooling of 3degC. Further studies prove that this deviation is due to the nonidea factors inherent within the device, e.g. semiconductor-metal contact resistance, Joule-heating from probe contact resistance etc. Thus to optimize the real device, it is necessary to chose a full model considering all the nonideal factors
三维体积硅微制冷机掺杂浓度优化
我们设计并制作了一个三维(3D)硅微制冷机,其冷却功率密度超过200W/cm,冷却温度仅为~1℃。高冷却功率密度主要是由于高导热性和热扩散效应。这些器件在热点管理方面具有潜在的应用价值,可以降低芯片的峰值温度,实现芯片上的热管理。为了研究和优化这些三维装置,建立了有限元模型。仿真结果表明,3D硅微冰箱(5e18 cm-3)的最佳掺杂浓度与传统ID器件不同,在5e19 cm-3掺杂时S2sigma达到最大。在最佳掺杂浓度下,这些硅微型冰箱的最大冷却温度可达3℃。进一步的研究证明,这种偏差是由于器件内部固有的非思想因素造成的,例如半导体-金属接触电阻,探针接触电阻的焦耳加热等。因此,为了优化实际设备,有必要选择一个考虑所有非理想因素的完整模型
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