{"title":"Photons, Charging Currents, Hydrogen, and Particle Bombardment - The Four Horsemen of Plasma Etching","authors":"S. Fonash","doi":"10.1109/PPID.1996.715236","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":206175,"journal":{"name":"Proceedings of 1st International Symposium on Plasma Process-Induced Damage","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 1st International Symposium on Plasma Process-Induced Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPID.1996.715236","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}