An investigation and comparison of 45-degree spread the modeland other techniques to extract junction temperature of HBT and PHEMT for reliability life test

S.C. Chen, B. Hsiao, F. Chou, K. Yu, H. Chou, C. Wu
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引用次数: 1

Abstract

Several techniques were applied on HBT and pHEMT evaluation vehicles fabricated at WIN Semiconductors' 6-inch GaAs foundry to extract device's junction temperature and compare the results and their impacts on the accelerated life test. From the reliability results of Arrhenius plots, the 45' spread model WIN Semiconductors used to obtain Tj matched well with liquid crystal thermography (LC) and Cooke model, but the infrared microscopy (IR) shows its space resolution limitation on the small area devices.
研究并比较了45度扩展模型和其他方法在HBT和PHEMT可靠性寿命试验中提取结温的方法
在WIN半导体的6英寸GaAs铸造厂制造的HBT和pHEMT评估车上应用了几种技术来提取器件的结温,并比较了结果及其对加速寿命测试的影响。从Arrhenius图的可靠性结果来看,WIN半导体公司用于获得Tj的45'扩展模型与液晶热成像(LC)和Cooke模型匹配良好,但红外显微镜(IR)在小面积器件上显示出空间分辨率的限制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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