Integral impact of BTI and voltage temperature variation on SRAM sense amplifier

I. Agbo, M. Taouil, S. Hamdioui, H. Kukner, P. Weckx, P. Raghavan, F. Catthoor
{"title":"Integral impact of BTI and voltage temperature variation on SRAM sense amplifier","authors":"I. Agbo, M. Taouil, S. Hamdioui, H. Kukner, P. Weckx, P. Raghavan, F. Catthoor","doi":"10.1109/VTS.2015.7116291","DOIUrl":null,"url":null,"abstract":"With the continuous downscaling of CMOS technologies, ICs become more vulnerable to transistor aging mainly due to Bias Temperature Instability (BTI). A lot of work is published on the impact of BTI in SRAMs; however most of the work focused mainly on the memory cell array. An SRAM consists also of peripheral circuitries such as address decoders, sense amplifiers, etc. This paper characterizes the combined impact of BTI and voltage temperature fluctuations on the memory sense amplifier for different technology nodes (45nm up to 16nm). The evaluation metric, the sensing delay (SD), is analyzed for various workloads. In contrast to earlier work, this paper thoroughly quantifies the increased impact of BTI in such sense amplifiers for all the relevant technology scaling parameters. The results show that the BTI impact for nominal voltage and temperature is 6.7% for 45nm and 12.0% for 16nm when applying the worst case workload, while this is 1.8% for 45nm technology and 3.6% higher for 16nm when applying the best case workload. In addition, the results show that the increase in power supply significantly reduces the BTI degradation; e.g., the degradation at -10%Vdd is 9.0%, while this does not exceed 5.3% at +10%Vdd at room temperature. Moreover, the results that the increase in temperature can double the degradation; for instance, the degradation at room temperature and nominal Vdd is 6.7% while this goes up to 18.5% at 398K.","PeriodicalId":187545,"journal":{"name":"2015 IEEE 33rd VLSI Test Symposium (VTS)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE 33rd VLSI Test Symposium (VTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VTS.2015.7116291","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 14

Abstract

With the continuous downscaling of CMOS technologies, ICs become more vulnerable to transistor aging mainly due to Bias Temperature Instability (BTI). A lot of work is published on the impact of BTI in SRAMs; however most of the work focused mainly on the memory cell array. An SRAM consists also of peripheral circuitries such as address decoders, sense amplifiers, etc. This paper characterizes the combined impact of BTI and voltage temperature fluctuations on the memory sense amplifier for different technology nodes (45nm up to 16nm). The evaluation metric, the sensing delay (SD), is analyzed for various workloads. In contrast to earlier work, this paper thoroughly quantifies the increased impact of BTI in such sense amplifiers for all the relevant technology scaling parameters. The results show that the BTI impact for nominal voltage and temperature is 6.7% for 45nm and 12.0% for 16nm when applying the worst case workload, while this is 1.8% for 45nm technology and 3.6% higher for 16nm when applying the best case workload. In addition, the results show that the increase in power supply significantly reduces the BTI degradation; e.g., the degradation at -10%Vdd is 9.0%, while this does not exceed 5.3% at +10%Vdd at room temperature. Moreover, the results that the increase in temperature can double the degradation; for instance, the degradation at room temperature and nominal Vdd is 6.7% while this goes up to 18.5% at 398K.
BTI和电压温度变化对SRAM感测放大器的整体影响
随着CMOS技术的不断缩小,ic越来越容易受到晶体管老化的影响,这主要是由于偏置温度不稳定性(BTI)。关于BTI在sram中的影响,已经发表了大量的工作;然而,大多数工作主要集中在存储单元阵列上。SRAM还包括外围电路,如地址解码器、感测放大器等。本文描述了BTI和电压温度波动对不同技术节点(45nm至16nm)存储感测放大器的综合影响。针对不同的工作负载,分析了评估指标感知延迟(SD)。与早期的工作相比,本文彻底量化了BTI在此类感测放大器中对所有相关技术缩放参数的影响。结果表明,在最坏情况下,45nm工艺对标称电压和温度的BTI影响为6.7%,16nm工艺为12.0%,而在最佳情况下,45nm工艺的BTI影响为1.8%,16nm工艺的BTI影响为3.6%。此外,结果表明,功率的增加显著降低了BTI的退化;例如,在-10%Vdd时的降解率为9.0%,而在室温下+10%Vdd时的降解率不超过5.3%。结果表明,温度升高可使降解速率加倍;例如,在室温和标称Vdd下的退化为6.7%,而在398K下则高达18.5%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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