Defect parameter extraction in backend process steps using a multilayer checkerboard test structure

C. Hess, L. Weiland
{"title":"Defect parameter extraction in backend process steps using a multilayer checkerboard test structure","authors":"C. Hess, L. Weiland","doi":"10.1109/ICMTS.1995.513944","DOIUrl":null,"url":null,"abstract":"To control defect appearance in numerous conducting layers of backend process steps, a novel multilayer checkerboard test structure (MCTS) is presented. The separation and localization of defects-causing electrically detectable intralayer short circuits as well as interlayer short circuits-is achieved by dividing the chip area into distinguishable small subchips inside given standard boundary pads without using any active semiconductor devices. The precise localization facilitates a versatile optical defect parameter extraction.","PeriodicalId":432935,"journal":{"name":"Proceedings International Conference on Microelectronic Test Structures","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1995.513944","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12

Abstract

To control defect appearance in numerous conducting layers of backend process steps, a novel multilayer checkerboard test structure (MCTS) is presented. The separation and localization of defects-causing electrically detectable intralayer short circuits as well as interlayer short circuits-is achieved by dividing the chip area into distinguishable small subchips inside given standard boundary pads without using any active semiconductor devices. The precise localization facilitates a versatile optical defect parameter extraction.
采用多层棋盘测试结构进行后端工艺步骤缺陷参数提取
为了控制多导电层后工序中出现的缺陷,提出了一种新的多层棋盘测试结构(MCTS)。在不使用任何有源半导体器件的情况下,通过在给定的标准边界衬垫内将芯片区域划分为可区分的小子芯片,可以实现缺陷的分离和定位(导致电可检测的层内短路和层间短路)。精确的定位有助于多用途的光学缺陷参数提取。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信